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Applied Materials Uvision 3
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IFTMS : In-situ Film Thickness Monitoring System
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TEL (Tokyo Electron Ltd) Telius SP-305 SCCM
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KLA-Tencor – KLA2139
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ANATECH P600 PLASMA CLEANER
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Kokusai Quixace II ALD TiN Vertical LPCVD Furnace
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Semitool SRD x 2 with Lotus Wet Bench
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Aixtron Crius-R MOCVD
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KLA SEM eCD-2 inspection measurement analysis – used metrology equipment
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Wafer Stocker
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Batch Wafer Processing
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