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KLA 2131 Defect Wafer Inspection System 200mm
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0.00
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KLA SEM eCD-2 inspection measurement analysis – used metrology equipment
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Hitachi S-3400N
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Leica INS 3300
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Applied Materials Complus MP
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Rudolph NSX 90
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0.00
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KLA-Tencor – KLA2139
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Suss MicroTec MA8/BA8 Mask Aligner Gen3
$
190,000.00
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